5 results
The Detrimental Effect of a Passivation on the Electromigration Lifetime of Narrow Al-Si-Cu Lines
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- Journal:
- MRS Online Proceedings Library Archive / Volume 391 / 1995
- Published online by Cambridge University Press:
- 15 February 2011, 447
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- 1995
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Stress Relaxation in Al-Si-Cu Thin Films and Lines
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- Journal:
- MRS Online Proceedings Library Archive / Volume 356 / 1994
- Published online by Cambridge University Press:
- 21 February 2011, 441
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- 1994
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Formation of ultrathin CoSi2 films using a two-step limited reaction process
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- Journal:
- Journal of Materials Research / Volume 8 / Issue 12 / December 1993
- Published online by Cambridge University Press:
- 03 March 2011, pp. 3111-3121
- Print publication:
- December 1993
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Ti-W-N Deposition Stress as a Function of Microstructure
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- Journal:
- MRS Online Proceedings Library Archive / Volume 308 / 1993
- Published online by Cambridge University Press:
- 15 February 2011, 51
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- 1993
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Investigation of an in-situ probe for phase transformations during RTP silicidation
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- Journal:
- MRS Online Proceedings Library Archive / Volume 260 / 1992
- Published online by Cambridge University Press:
- 25 February 2011, 145
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- 1992
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